EUV progress, hurdles cited

Global SourcesUpdated on 2023/12/01

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Intel and Samsung are positive about EUV lithography, one of the main technologies for a 5nm process.

EUV lithography is making significant progress, according to talks from Intel and Samsung specialists at a recent annual event in California. But enough hurdles remain to prevent either company making public commitments about when it will start using the technology.

Separately, the Imec research institute announced techniques for creating a 5nm process technology using EUV to assist today's immersion scanners. EUV is generally expected to see adoption in about 2020 on a few critical steps to avoid using more than four exposures with today's 193nm immersion steppers.

"It's my belief immersion will be the workhorse and EUV will be used for select layers," said Ben Tsai, chief technologist of KLA-Tencor in a keynote opening the SPIE Advanced Lithography conference.

Samsung suggested it is pressing forward with plans announced in October to use EUV for its 7nm node, but it has yet to say how and when. Intel reiterated its guidance of the last several years that EUV is "highly desirable for the 7nm node, but will only be used when it is ready."

To read the full article, go to EETimes.

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EUV progress, hurdles cited

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